Pattern Driven Resist Placement Yields Consistent Etch Results
The Drop Pattern Generator combines a multiprocessor server with Canon Nanotechnologies proprietary software in a patented process to generate drop patterns of resist seamlessly from a GDS pattern that conform to imprint template features. Using this combination along with the proper metrology allows for generation of highly optimized drop patterns. Drop pattern optimization provides improved residual layer thickness uniformity and ensures proper fluid filling into the template during imprint. A thin (<15nm) and consistent residual layer film results in better CD uniformity, and ultimately better device performance and yield.