Industry-first Nanoimprint Lithography Solution for Semiconductor 6025 Mask Replication
The MR5000 nanoimprint mask replication system is designed to faithfully and cost-effectively reproduce leading-edge resolution original master masks for the manufacture of critical semiconductor memory device layers. The MR5000 system is based on Canon Nanotechnologies’ proprietary Jet and Flash Imprint Lithography (J-FIL) technology and utilizes the full capability of the 6025 format optical mask writing infrastructure to fabricate its masters and provide replication of 1XnmHP half pitch patterns onto a 6025 dimensioned substrate with high throughput and extremely low added distortion.
The MR5000 uses nanoimprint lithography to enable leading-edge patterning at the lowest cost of ownership in the semiconductor industry, with the added benefit of mask format compatibility for easy integration into the existing photomask ecosystem.
Resolution: 1X nanometer half pitch
Image placement: 2nm, 3s uncorrectable distortion above master
Automation: Fully automated substrate handling
Throughput: 4 mask replicas/hour
Field Size: 26mm x 33mm
Note: The MR5000 is a legacy tool. For information regarding new Canon Nanotechnologies systems, please contact email@example.com