High Resolution, Low Cost CMOS Nanoimprint Lithography System
The Imprio 450 is a next generation nanoimprint lithography system, and is designed with demanding CMOS applications in mind. The Imprio 450 system represents the industry’s highest resolution and lowest cost-of-ownership nanoimprint lithography solution for IC prototyping and process development at the 24nm node and beyond. It is also the first lithography system of its kind to address the nanopatterning of both 300mm and 450mm substrates.
The Imprio 450 uses Canon Nanotechnologies Jet and Flash Imprint Lithography (J-FIL) technology, including a Drop Pattern Generator, to place low-viscosity resist only where needed on the substrate. Canon Nanotechnologies technology is superior to spin-on imprint techniques that waste consumables and require the purchase of costly and space-consuming track. The Imprio 450 uses imprint masks, resists, and sources to achieve sub-24nm half-pitch resolution, sub-10nm alignment, integrated magnification control, and fully automated wafer and mask loading. Imprio 450 is ideal for process development, advanced device prototyping and cell library development at the 24nm and 1x nm nodes.
Resolution: Sub-24nm half pitch demonstrated
Alignment: < 10nm demonstrated, 3σ (single point, X,Y)
Automation: Fully automated wafer and mask loading
Flexibility: 300mm and 450mm substrates (SEMI standard)
Field size: 26mm x 33mm (step-and-scan compatible)
Note: The Imprio 450 is a legacy tool. For information regarding new Canon Nanotechnologies systems, please contact firstname.lastname@example.org